Mainly used for the development and production of small and medium-sized integrated circuits, semiconductor components, and surface acoustic wave devices. Due to the advanced leveling mechanism and small leveling force of this machine, this machine is suitable for the exposure of silicon wafers, glass wafers, ceramic wafers, copper wafers, stainless steel wafers, gemstone wafers, etc.

 

 

1. Configure a film-bearing table. (The specific dimensions of the film-bearing table can be manufactured according to user requirements)

2. Exposure head (using multi-point light source exposure head)

*Emission spot ≤230mm; 350W (high voltage DC mercury lamp)

*Light non-uniformity is ≤±4% within the range of φ100mm;

* Achieve exposure under vacuum tight conditions

* Exposure time, set by time relay from 0.1 to 999.9 seconds

* The position of the mercury lamp can be adjusted through precise x, y, z adjustment devices, and the adjustment amount is in the x direction

±5 mm, ±5 mm in y direction, ±5 mm in z direction

* With fan cooling device

3. Resolution ≥φ100, 1μm

4. Equipped with vacuum suction function

5. It has the functions of vacuum sealing and back-flushing. By adjusting the size of the sealing vacuum,

Realize hard contact exposure (tight vacuum ≤ -0.05 Mpa), soft contact exposure (tight vacuum between - 0.05Mpa ~ -0.02Mpa) and micro-force contact exposure (tight vacuum ≥ -0.02Mpa)

Immersion lithography machine is an advanced semiconductor manufacturing equipment mainly used for photolithography in the semiconductor chip manufacturing process. This photolithography machine uses liquid (usually UV-transparent photoresist) instead of air as the medium between the photolithography layer and the photolithography template, which can achieve higher-resolution patterning and improve the accuracy and performance of the chip.

Immersion lithography machine has a number of advanced technologies and functions, including high-speed and high-precision optical systems, intelligent control systems, precision liquid handling systems, etc. It is easy to operate, can achieve fast and efficient production, and is widely used in integrated circuits, memories, sensors and other fields.

 

 

High resolution: Using liquid immersion technology, it can achieve higher resolution and more detailed graphics processing, improving the performance and reliability of the chip.

High precision: Equipped with advanced optical systems and control systems, it can achieve high-precision graphics processing and ensure the quality and stability of the chip.

High efficiency: It is easy to operate, can achieve fast and efficient production, improve production efficiency and reduce production costs.

Versatility: Photolithography machines of different specifications and models can be customized according to customer needs to meet the needs of different industries and application fields.

 

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